Bis-(4-tert-butylphenyl)-iodonium Trifluoromethylbenzene Sulfonate CAS 229325-98-8 – Srinivasa Petro Chemicals

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Bis-(4-tert-butylphenyl)-iodonium Trifluoromethylbenzene Sulfonate CAS…

Bis-(4-tert-butylphenyl)-iodonium Trifluoromethylbenzene Sulfonate CAS 229325-98-8

Chemical Name: Bis-(4-tert-butylphenyl)-iodonium trifluoromethylbenzene sulfonate
CAS No.: 229325-98-8
Molecular Fomula: C27H30F3IO3S

Molecular weight: 618.49 g/mol

Appearance: White to off-white crystalline powder

Assay:≥98.0%

Category: Catalysts & Chemical Auxiliary Agents

Description

Bis-(4-tert-butylphenyl)-iodonium trifluoromethylbenzene sulfonate Quick Details

Chemical Name: Bis-(4-tert-butylphenyl)-iodonium trifluoromethylbenzene sulfonate
CAS No.: 229325-98-8
Molecular Fomula: C27H30F3IO3S

Chemical Structure:

Bis-(4-tert-butylphenyl)-iodonium trifluoromethylbenzene sulfonate 

Molecular weight: 618.49 g/mol

Appearance: White to off-white crystalline powder

Assay:≥98.0%

Bis-(4-tert-butylphenyl)-iodonium trifluoromethylbenzene Sulfonate Typical Properties

ITEMS SPECIFICATION
Appearance White to off-white crystalline powder
Purity, % 98.0%
Melting Point 160-170°C
Solubility Soluble in organic solvents (e.g., dichloromethane, acetone); insoluble in water

Bis-(4-tert-butylphenyl)-iodonium trifluoromethylbenzene sulfonate application:

  • Used as a cationic photoinitiator in UV-curable coatings, adhesives, and inks.
  • Employed in photolithography for photoresist formulations.
  • Suitable for cationic polymerization of epoxy and oxetane-based resins.
  • Applied in material science for the synthesis of self-assembling monolayers (SAMs) and advanced composites.

Bis-(4-tert-butylphenyl)-iodonium trifluoromethylbenzene sulfonate Packaging and Shipping 

Available in 1 kg, 5 kg, or 25 kg containers, or as per customer requirements.

Bis-(4-tert-butylphenyl)-iodonium trifluoromethylbenzene sulfonate Storage

  • Store in a cool, dry, well-ventilated area away from light and moisture.
  • Keep containers tightly closed when not in use.
  • Avoid contact with strong oxidizers, bases, or reducing agents.

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